The Multipole Resonance Probe: Progression and Evaluation of a Process Compatible Plasma Sensor

Christian Schulz, Tim Styrnoll, Robert Storch, Peter Awakowicz, Thomas Musch, Ilona Rolfes

IEEE Sensors Journal, Vol.14, No.10, pp. 3408-3417, DOI: 10.1109/JSEN.2014.2333659, Oct 2014


A robust and sensitive plasma sensor, the multipole resonance probe (MRP), and its process compatibility are presented and discussed in this paper. Based on its innovative concept and simple model describing the system “probe-plasma”, three steps of development are introduced. 3D electromagnetic field simulations are applied as an indispensable tool for an economical and efficient investigation and optimization of different sensor layouts. Independent of the chosen sensor design, a developed pulse-based measurement device yields an economical signal generation and evaluation. Electron density profiles, determined with the MRP and the pulse-based system utilized in a capacitive coupled plasma, confirm and demonstrate the simulation results and the measurement concept, respectively.

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